Pure Si and 500 K has an equal number of electron and holes of concentration 1.5 x 1016 . Doping by indium increases hole concentration (nh) to 4.5 x 1022 m-3. The doped semiconductor is
(1) n–type; with electron concentration of 5 x 1022 m-3
(2) p–type; with electron concentration of 2.5 x 1010 m-3
(3) n–type; with electron concentration of 2.5 x 1023 m-3
(4) p–type; with electron concentration of 5 x 109 m-3