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Pure Si and 500 K has an equal number of electron and holes of concentration 1.5 x 1016 . Doping by indium increases hole concentration (nh) to 4.5 x 1022 m-3. The doped semiconductor is

(1) n–type; with electron concentration of 5 x 1022 m-3

(2) p–type; with electron concentration of 2.5 x 1010 m-3

(3) n–type; with electron concentration of 2.5 x 1023 m-3

(4) p–type; with electron concentration of 5 x 109 m-3

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(4) p–type; with electron concentration of 5 x 109 m-3

Given ne = 1.5 x 1016 m-3, nh = 4.5 x 1022 m-3 

Let ne be the concentration of electrons we know

Since nh > ne ; the material as a p–type semiconductor. The electron concentration = ne = 5 x 109 m-3 .

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